Deep insights into Interface Effects to achieve Low-voltage Operation (<1.2V), Low Process Temperature, and First-Principle Calculation

Y. T. Tang, T. M. Wu, C. L. Fan, Y. M. Lai, K. Y. Hsiang, C. Y. Liao, S. H. Chang, T. Y. Yu, P. Su, M. T. Chang, B. H. Huang, C. Hu, S. J. Chang, M. F. Chang, M. H. Lee

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

To address the strategy of interface effects to achieve low-voltage operation in ferroelectric devices, this work presents a systematical study on Hf0.5Zr0.5O2 ferroelectric(FE) capacitors. Firstly, by detail electrical characterization of P-V curves under varied electrodes and ambient gas, two factors governed ferroelectric switching can be well distinguished. Then by combining the kinetical pulse measurements and first-principle calculation, it is found that, 1) the intrinsic dead-layer effect exits in nanocapacitors; 2) the ferroelectric domain switching speed and coherency can be boosted via lower thermal budget O2 treatment. Finally, a material with coherency and ultra-low access voltage as design guideline for sub-3nm technology eNVM is provided.

Original languageEnglish
Title of host publication2021 IEEE International Symposium on Radio-Frequency Integration Technology, RFIT 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665433914
DOIs
StatePublished - 25 Aug 2021
Event2021 IEEE International Symposium on Radio-Frequency Integration Technology, RFIT 2021 - Hualien, Taiwan
Duration: 25 Aug 202127 Aug 2021

Publication series

Name2021 IEEE International Symposium on Radio-Frequency Integration Technology, RFIT 2021

Conference

Conference2021 IEEE International Symposium on Radio-Frequency Integration Technology, RFIT 2021
Country/TerritoryTaiwan
CityHualien
Period25/08/2127/08/21

Keywords

  • Domain coherent switching
  • interfacial dead layer
  • NLS

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