Abstract
The techniques of XPS, UPS and HREELS are utilized to investigate the thermal decomposition of trimethyl indium (TMIn) on Si (111) -7 × 7. At 120 K, TMIn was primarily molecularly adsorbed on the surface. As the sample was annealed at higher temperatures, species such as CH3, CH2, In, C and H, etc., were identified. At temperatures above 950 K, SiC was the only species detected.
| Original language | English |
|---|---|
| Pages (from-to) | 207-213 |
| Number of pages | 7 |
| Journal | Materials Letters |
| Volume | 14 |
| Issue number | 4 |
| DOIs | |
| State | Published - 1 Jan 1992 |
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