Conventional III-V Materials and Devices on Silicon

Edward Yi Chang*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Abstract

Materials with high channel mobility are essential as silicon CMOS technology approaches the 30 nm node and beyond. III-V compound semiconductors, with their high mobility and drift velocity under the influence of low electric field, are considered the most promising materials to realize nextgeneration nanoelectronic applications. Table 13.1 compares relevant channel material properties of Si, Ge, and main III-V semiconductors [Takagi 2008].

Original languageEnglish
Title of host publicationIII-V Compound Semiconductors
Subtitle of host publicationIntegration with Silicon-Based Microelectronics
PublisherCRC Press
Pages475-522
Number of pages48
ISBN (Electronic)9781439815236
ISBN (Print)9780367383268
DOIs
StatePublished - 1 Jan 2016

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