Abstract
Materials with high channel mobility are essential as silicon CMOS technology approaches the 30 nm node and beyond. III-V compound semiconductors, with their high mobility and drift velocity under the influence of low electric field, are considered the most promising materials to realize nextgeneration nanoelectronic applications. Table 13.1 compares relevant channel material properties of Si, Ge, and main III-V semiconductors [Takagi 2008].
Original language | English |
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Title of host publication | III-V Compound Semiconductors |
Subtitle of host publication | Integration with Silicon-Based Microelectronics |
Publisher | CRC Press |
Pages | 475-522 |
Number of pages | 48 |
ISBN (Electronic) | 9781439815236 |
ISBN (Print) | 9780367383268 |
DOIs | |
State | Published - 1 Jan 2016 |