Controlling bottom-up rapid growth of single crystalline gallium nitride nanowires on silicon

Ko Li Wu, Yi Chou, Chang Chou Su, Chih Chaing Yang, Wei-I Lee, Yi-Chia Chou*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations


We report single crystalline gallium nitride nanowire growth from Ni and Ni-Au catalysts on silicon using hydride vapor phase epitaxy. The growth takes place rapidly; efficiency in time is higher than the conventional nanowire growth in metal-organic chemical vapor deposition and thin film growth in molecular beam epitaxy. The effects of V/III ratio and carrier gas flow on growth are discussed regarding surface polarity and sticking coefficient of molecules. The nanowires of gallium nitride exhibit excellent crystallinity with smooth and straight morphology and uniform orientation. The growth mechanism follows self-assembly from both catalysts, where Au acts as a protection from etching during growth enabling the growth of ultra-long nanowires. The photoluminescence of such nanowires are adjustable by tuning the growth parameters to achieve blue emission. The practical range of parameters for mass production of such high crystal quality and uniformity of nanowires is suggested.

Original languageAmerican English
Article number17942
JournalScientific reports
Issue number1
StatePublished - 1 Dec 2017


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