Control of plasmon dephasing time using stacked nanogap gold structures for strong near-field enhancement

Keyphrases

• Near-field Enhancement 100%
• Nanogap 100%
• Dephasing Time 100%
• Plasmon Dephasing 100%
• Gold Structures 100%
• Dark Plasmon Modes 60%
• Field Enhancement 40%
• Au Nanostructures 40%
• Electron Beam Lithography 20%
• Electromagnetic Field 20%
• Time-based 20%
• Structural Design 20%
• Ordered Arrays 20%
• Plasmon Coupling 20%
• Plasmon Modes 20%
• Metal-insulator-metal 20%
• Dry Etching Process 20%
• Metallic Nanostructures 20%
• Plasmonic Devices 20%
• Metal Nanostructures 20%
• Sensor Energy 20%
• Energy Conversion Systems 20%
• Near-field Coupling 20%
• Alumina Layer 20%
• Nanoblock 20%
• Plasmonic Sensor 20%
• Niobium-doped Titania 20%
• Doped Titanium Dioxide 20%
• Time-resolved Photoemission Spectroscopy 20%
• Light Energy Conversion 20%

Engineering

• Field Enhancement 100%
• Nanomaterial 80%
• Plasmonics 60%
• Metal-Insulator-Metal 20%
• Aluminum Oxide 20%
• Dry Etching 20%
• Etching Process 20%
• Optical Power 20%
• Electron Optical Lithography 20%
• Photoemission 20%
• Structural Design 20%
• Energy Conversion 20%

Material Science

• Dephasing 100%
• Nanostructure 80%
• Dry Etching 20%
• Lithography 20%
• Titanium Dioxide 20%
• Aluminum Oxide 20%
• Optical Power 20%
• Niobium 20%
• Photoemission Electron Microscopy 20%