Continually-Adapted Margin and Multi-Anchor Distillation for Class-Incremental Learning

Yi Hsin Chen*, Dian Shan Chen*, Ying Chieh Weng, Wen Hsiao Peng, Wei Chen Chiu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper addresses the problem of class-incremental learning. The model is trained to recognize the classes added incrementally. It thus suffers from the challenging issue of catastrophic forgetting. Stemming from the knowledge distillation idea of attempting to retain the model's knowledge on seen classes while learning the newly-added ones, we advance to further alleviate the catastrophic forgetting via our proposed multi-anchor distillation objective, which is realized by constraining the spatial relationship between the input data and the multiple class embeddings of each seen class in the feature space while training the model. Moreover, since the knowledge distillation for incremental learning generally relies on keeping a replay buffer to store the samples of seen classes, the buffer of limited size brings another issue of class imbalance: the number of samples from each seen class decreases gradually, thus being much smaller than the number of samples from each new class. We therefore propose to introduce the continually-adapted margin into the classification objective for tackling the prediction bias towards new classes caused by the class imbalance. Experiments are conducted on various datasets and settings to demonstrate the effectiveness and superior performance of our proposed techniques in comparison to several state-of-the-art baselines.

Original languageEnglish
Title of host publication2023 IEEE International Conference on Systems, Man, and Cybernetics
Subtitle of host publicationImproving the Quality of Life, SMC 2023 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages920-927
Number of pages8
ISBN (Electronic)9798350337020
DOIs
StatePublished - 2023
Event2023 IEEE International Conference on Systems, Man, and Cybernetics, SMC 2023 - Hybrid, Honolulu, United States
Duration: 1 Oct 20234 Oct 2023

Publication series

NameConference Proceedings - IEEE International Conference on Systems, Man and Cybernetics
ISSN (Print)1062-922X

Conference

Conference2023 IEEE International Conference on Systems, Man, and Cybernetics, SMC 2023
Country/TerritoryUnited States
CityHybrid, Honolulu
Period1/10/234/10/23

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