Conducting poly(aniline-co-N-propanesulfonic acid aniline) (PAPSAH) as charge dissipation layer for e-beam lithography

Shyi Long Shy*, Tien-Sheng Chao, Tan F. Lei, Shaw An Chen, Wen An Loong, Chun Yen Chang

*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

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Engineering

Medicine and Dentistry

Chemical Engineering

Material Science