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Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
John Borland, Shang Shuin Chaung, Tseung-Yuen Tseng, Abhijeet Joshi, Bulent Basol, Yao Jen Lee, Takashi Kuroi, Gary Goodman, Nadya Khapochkina, Temel Buyuklimanli
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review