CMOS technology: High performance ALD HfO2-Al2O3laminate MIM capacitors for RF and mixed signal IC applications

Hang Hu, Shi Jin Ding, H. F. Lim, Chunxiang Zhu, M. F. Li, S. J. Kim, X. F. Yu, J. H. Chen, Y. F. Yong, Byung Jin Cho, D. S.H. Chan, Subhash C. Ruslagi, M. B. Yu, C. H. Tung, Anyan Du, Doan My, P. D. Foo, Albert Chin, Dim Lee Kwong

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

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Engineering & Materials Science