Original language | English |
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Pages (from-to) | 321 |
Number of pages | 1 |
Journal | Technical Digest - International Electron Devices Meeting |
State | Published - Dec 2000 |
Event | 2000 IEEE International Electron Devices Meeting - San Francisco, CA, United States Duration: 10 Dec 2000 → 13 Dec 2000 |
CMOS and interconnect reliability - Reliability of thin oxides
H. Iwai*, J. Suñé
*Corresponding author for this work
Research output: Contribution to journal › Short survey › peer-review