Circular etch pits in ion-implanted amorphous silicon films

Keyphrases

• Ion Implantation 100%
• Amorphous Silicon Thin Film 100%
• Etch pit 100%
• Circular pit 100%
• Amorphous Si 50%
• Bombardment 50%
• HF Solution 50%
• High Dose 50%
• Etchant 50%
• Si Surface 50%
• Ion Bombardment 50%
• Low Resistance 50%
• Vapor Deposition 50%
• Etching Behavior 50%
• Evaporated Films 50%