Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography

Chun Cheng Yeh*, Hung Chuan Liu, Wajdi Heni, Dominique Berling, Hsiao-Wen Zan, Olivier Soppera

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

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Engineering & Materials Science

Chemical Compounds