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Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography
Chun Cheng Yeh*, Hung Chuan Liu, Wajdi Heni, Dominique Berling, Hsiao-Wen Zan, Olivier Soppera
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
31
Scopus
citations