Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography
- Chun Cheng Yeh*
- , Hung Chuan Liu
- , Wajdi Heni
- , Dominique Berling
- , Hsiao-Wen Zan
- , Olivier Soppera
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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