Fingerprint
Dive into the research topics of 'Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
C. D. Young*, A. Kerber, Tuo-Hung Hou, E. Cartier, G. A. Brown, G. Bersuker, Y. Kim, C. Lim, J. Gutt, P. Lysaght, J. Bennett, C. H. Lee, S. Gopalan, M. Gardner, P. Zeitzoff, G. Groeseneken, R. W. Murto, H. R. Huff
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
7
Scopus
citations