Characterization of four-level random telegraph noise in a gate-all-around poly-Si nanowire transistor

You Tai Chang, Pei Wen Li, Horng Chih Lin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Four-level random-telegraph-noise (RTN) characteristics of a gate-all-around (GAA) poly-Si junctionless (JL) nanowire (NW) transistor induced by two discrete traps are studied in this work. By carefully analyzing the RTN, depths of the two traps in the gate oxide can be identified separately. Consistent information is obtained by assessing the probability of transitions between different levels.

Original languageEnglish
Title of host publication2019 Silicon Nanoelectronics Workshop, SNW 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9784863487024
DOIs
StatePublished - Jun 2019
Event24th Silicon Nanoelectronics Workshop, SNW 2019 - Kyoto, Japan
Duration: 9 Jun 201910 Jun 2019

Publication series

Name2019 Silicon Nanoelectronics Workshop, SNW 2019

Conference

Conference24th Silicon Nanoelectronics Workshop, SNW 2019
Country/TerritoryJapan
CityKyoto
Period9/06/1910/06/19

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