Characteristics of low-k methyl-silsesquiazane (MSZ) for CMP process using oxygen plasma pretreatment

Po-Tsun Liu*, TC Chang, TM Tsai, ST Yan, YC Chang, H Aoki, TY Tseng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Physics & Astronomy