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Characteristics of HfO 2 /Poly-Si interfacial layer on CMOS LTPS-TFTs with HfO 2 gate dielectric and O 2 plasma surface treatment
Ming Wen Ma*, Tsung Yu Chiang, Woei Cherng Wu, Tien-Sheng Chao, Tan Fu Lei
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
20
Scopus
citations