Characteristics of atomic-layer-deposited Al2O3 high- k dielectric films grown on Ge substrates

Chao Ching Cheng*, Chao-Hsin Chien, Guang Li Luo, Jun Cheng Liu, Chi Chung Kei, Da Ren Liu, Chien Nan Hsiao, Chun Hui Yang, Chun Yen Chang

*Corresponding author for this work

    Research output: Contribution to journal › Article › peer-review

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    Material Science