Capturing H and H₂ by SiH_x ⁺ (x ≤ 4) ions: Comparison between Langevin and quantum statistical models

Keyphrases

• Plasma-enhanced Chemical Vapor Deposition (PECVD) 100%
• Langevin 100%
• Quantum Statistical Methods 100%
• Order of Magnitude 50%
• Temperature Effect 50%
• Reaction Pathway 50%
• Deposition Conditions 50%
• A-Si 50%
• Heat of Formation 50%
• Theory Calculation 50%
• Quantum Chemistry 50%
• Statistical Theory 50%
• Chemical Theory 50%
• Modern Theory 50%
• Activation Entropy 50%

Chemistry

• Plasma Enhanced Chemical Vapor Deposition 100%
• Rate Constant 50%
• Enthalpy of Formation 50%
• Reaction Path 50%

Material Science

• Plasma-Enhanced Chemical Vapor Deposition 100%
• Film 50%