Body voltage modulation for high performance a-IGZO TFT and its application on new inverter structure

Hsiao-Wen Zan*, Wei Tsung Chen, Hsiu Wen Hsueh, Chun Cheng Yeh, Chuang Chuang Tsai, Hsin-Fei Meng, Chia Chun Yeh, Ted Hong Shinn

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We develop a new and simple method to adjust the threshold voltage of a-IGZO TFT by capping different metals on device back channel. A threshold voltage shifts from -7.4V to +5.5V can be obtained. The field-effect mobility is 2 to 3 times larger than the one before metal capping. An n-type a-IGZO inverter includes one enhancement-mode TFT (capped by titanium) and one depletion-mode TFT (capped by calcium/aluminum dual layer) is fabricated. The voltage gain is 38 when the bias voltage is 20 volts.

Original languageEnglish
Title of host publication49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011
Pages1158-1161
Number of pages4
StatePublished - 1 Dec 2011
Event49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011 - Los Angeles, CA, United States
Duration: 15 May 201120 May 2011

Publication series

Name49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011
Volume3

Conference

Conference49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011
Country/TerritoryUnited States
CityLos Angeles, CA
Period15/05/1120/05/11

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