Abstract
We reported an ultra low-power resistive random access memory (RRAM) combining a low-cost Ni electrode and covalent-bond GeO x dielectric. This cost-effective Ni/GeO x /TaN RRAM device has very small set power of 2 μW, ultra-low reset power of 130 pW, greater than 1 order of magnitude resistance window, and stable retention at 85 °C. The current flow at low-resistance state is governed by Poole-Frenkel conduction with electrons hopping via defect traps, which is quite different from the filament conduction in metal-oxide RRAM.
Original language | English |
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Pages (from-to) | 90-93 |
Number of pages | 4 |
Journal | Solid-State Electronics |
Volume | 62 |
Issue number | 1 |
DOIs | |
State | Published - 1 Aug 2011 |
Keywords
- Germanium oxide (GeO )
- Resistive random access memory (RRAM)