Atomic layer defect-free etching for germanium using HBr neutral beam

Takuya Fujii, Daisuke Ohori, Shuichi Noda, Yosuke Tanimoto, Daisuke Sato, Hideyuki Kurihara, Wataru Mizubayashi, Kazuhiko Endo, Yi-Ming Li, Yao-Jen Lee, Takuya Ozaki, Seiji Samukawa*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

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Keyphrases

Engineering

Material Science