Asymmetric Low Temperature Bonding Structure with Thin Solder Layers Using Ultra-Thin Buffer Layer

Ting-Yang Yu, Hag-Wen Liang, Yao-Jen Chang, Kuan-Neng Chen*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Asymmetric Cu to In/Sn bonding structure with Ni ultrathin buffer layer (UBL) on Cu side is investigated in this research. The usage of Ni UBL slows down intermetallic compound (IMC) formation during bonding. Asymmetric structure can separate electrical isolation and solder process to avoid interaction, which can prevent IMC formation during polymer curing. A well-bonded asymmetric structure can be achieved with submicron solder by 150 degrees C bonding for 15 min. The structure shows the potential for low temperature hybrid bonding technology in high-density three-dimensional (3D) integration.

Original languageEnglish
Pages (from-to)5397-5403
Number of pages7
JournalJournal of Nanoscience and Nanotechnology
Volume18
Issue number8
DOIs
StatePublished - Aug 2018

Keywords

  • 3D Integration
  • 3D Integrated Circuit (3D-IC)
  • Asymmetric Bonding
  • Hybrid Bonding
  • Interconnect
  • Micro Bump

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