TY - GEN
T1 - Approach to room temperature process - A novel thin liquid-phase deposited oxide
AU - Yeh, CF
AU - Lin, Shumin
PY - 1996
Y1 - 1996
N2 - To continuously reduce dimensions, and increase reliability of devices, low-temperature process (LTP) is an important issue. Pursuing a novel LTP, room-temperature process can be as a norm. In this paper, as an approach to room-temperature process, the feasible technologies of versatile liquid-phase deposited oxide will be introduced.
AB - To continuously reduce dimensions, and increase reliability of devices, low-temperature process (LTP) is an important issue. Pursuing a novel LTP, room-temperature process can be as a norm. In this paper, as an approach to room-temperature process, the feasible technologies of versatile liquid-phase deposited oxide will be introduced.
M3 - Conference contribution
SN - 1-56677-168-4
T3 - ELECTROCHEMICAL SOCIETY SERIES
SP - 149
EP - 160
BT - PROCEEDINGS OF THE SYMPOSIUM ON SURFACE OXIDE FILMS
A2 - Bardwell, JA
PB - Electrochemical Society Inc.
T2 - Symposium on Surface Oxide Films, at the Fall Meeting of the Electrochemical-Society-Inc
Y2 - 7 October 1996 through 9 October 1996
ER -