Application of supercritical fluids for amorphous silicon thin film transistors

Chih Tsung Tsai*, Ting Chang Chang, Po-Tsun Liu, Po Yu Yang

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review


Supercritical fluid technology[1-2] is employed for the first time to passivate the defect states in amorphous silicon thin film transistors (a-Si:H TFTs) at low temperature (150°C). Due to supercritical fluids have gas-like properties of diffusivity and viscosity that allow it to efficiently carry H2O molecule into amorphous thin film and passivates defects at low temperature. Experiment results indicate that superior transfer characteristic is obtained and the density of states (DOS) is reduced significantly after the treatment of supercritical fluids mixed with water/propyl alcohol.

Original languageEnglish
Number of pages2
StatePublished - Dec 2006
Event13th International Display Workshops, IDW '06 - Otsu, Japan
Duration: 6 Dec 20066 Dec 2006


Conference13th International Display Workshops, IDW '06


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