Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

Po-Tsun Liu; T. C. Chang; Z. W. Lin; T. M. Tsai; C. W. Chen; B. C. Chen; J. K. Lee; Grace Chen; Eric Tsai; Joe Chang

doi:10.1109/IMNC.2003.1268600

Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

Po-Tsun Liu^*, T. C. Chang, Z. W. Lin, T. M. Tsai, C. W. Chen, B. C. Chen, J. K. Lee, Grace Chen, Eric Tsai, Joe Chang

^*Corresponding author for this work

Department of Photonics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

In this paper, a direct patterning technology of non-photosensitive silicate based hydrogen silsesquioxane was investigated with electron beam lithography for IMD applications.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	110
Number of pages	1
ISBN (Electronic)	4891140402, 9784891140403
DOIs	https://doi.org/10.1109/IMNC.2003.1268600
State	Published - 2003
Event	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan Duration: 29 Oct 2003 → 31 Oct 2003

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

Conference	International Microprocesses and Nanotechnology Conference, MNC 2003
Country/Territory	Japan
City	Tokyo
Period	29/10/03 → 31/10/03

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10.1109/IMNC.2003.1268600

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Liu, P.-T., Chang, T. C., Lin, Z. W., Tsai, T. M., Chen, C. W., Chen, B. C., Lee, J. K., Chen, G., Tsai, E., & Chang, J. (2003). Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 110). Article 1268600 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268600

Liu, Po-Tsun ; Chang, T. C. ; Lin, Z. W. et al. / Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 110 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

@inproceedings{98035188b23f4e5ab665b930bc56bbbd,

title = "Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology",

abstract = "In this paper, a direct patterning technology of non-photosensitive silicate based hydrogen silsesquioxane was investigated with electron beam lithography for IMD applications.",

author = "Po-Tsun Liu and Chang, {T. C.} and Lin, {Z. W.} and Tsai, {T. M.} and Chen, {C. W.} and Chen, {B. C.} and Lee, {J. K.} and Grace Chen and Eric Tsai and Joe Chang",

note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",

year = "2003",

doi = "10.1109/IMNC.2003.1268600",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "110",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

address = "美國",

}

Liu, P-T, Chang, TC, Lin, ZW, Tsai, TM, Chen, CW, Chen, BC, Lee, JK, Chen, G, Tsai, E & Chang, J 2003, Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268600, Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, Institute of Electrical and Electronics Engineers Inc., pp. 110, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 29/10/03. https://doi.org/10.1109/IMNC.2003.1268600

Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology. / Liu, Po-Tsun; Chang, T. C.; Lin, Z. W. et al.
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 110 1268600 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

AU - Liu, Po-Tsun

AU - Chang, T. C.

AU - Lin, Z. W.

AU - Tsai, T. M.

AU - Chen, C. W.

AU - Chen, B. C.

AU - Lee, J. K.

AU - Chen, Grace

AU - Tsai, Eric

AU - Chang, Joe

PY - 2003

Y1 - 2003

N2 - In this paper, a direct patterning technology of non-photosensitive silicate based hydrogen silsesquioxane was investigated with electron beam lithography for IMD applications.

AB - In this paper, a direct patterning technology of non-photosensitive silicate based hydrogen silsesquioxane was investigated with electron beam lithography for IMD applications.

UR - http://www.scopus.com/inward/record.url?scp=84949193627&partnerID=8YFLogxK

U2 - 10.1109/IMNC.2003.1268600

DO - 10.1109/IMNC.2003.1268600

M3 - Conference contribution

AN - SCOPUS:84949193627

T3 - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

SP - 110

BT - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - International Microprocesses and Nanotechnology Conference, MNC 2003

Y2 - 29 October 2003 through 31 October 2003

ER -

Liu PT, Chang TC, Lin ZW, Tsai TM, Chen CW, Chen BC et al. Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 110. 1268600. (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). doi: 10.1109/IMNC.2003.1268600

Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

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