Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

Po-Tsun Liu*, T. C. Chang, Z. W. Lin, T. M. Tsai, C. W. Chen, B. C. Chen, J. K. Lee, Grace Chen, Eric Tsai, Joe Chang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

In this paper, a direct patterning technology of non-photosensitive silicate based hydrogen silsesquioxane was investigated with electron beam lithography for IMD applications.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages1
ISBN (Electronic)4891140402, 9784891140403
DOIs
StatePublished - 1 Jan 2003
EventInternational Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan
Duration: 29 Oct 200331 Oct 2003

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

ConferenceInternational Microprocesses and Nanotechnology Conference, MNC 2003
Country/TerritoryJapan
CityTokyo
Period29/10/0331/10/03

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