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Anomalous negative bias temperature instability behavior in p -channel metal-oxide-semiconductor field-effect transistors with HfSiON/SiO2 gate stack

  • Shih Chang Chen*
  • , Chao-Hsin Chien
  • , Jen Chung Lou
    • *Corresponding author for this work

    Research output: Contribution to journal › Article › peer-review

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