Annealing effect of scratch characteristics of ZnMgO epilayers on R-plane sapphire

Hua Chiang Wen; Ming Chu Hsieh; Yu-Pin Lan; Wu-Ching Chou

doi:10.1515/ijmr-2020-7766

Annealing effect of scratch characteristics of ZnMgO epilayers on R-plane sapphire

Hua Chiang Wen, Ming Chu Hsieh, Yu-Pin Lan, Wu-Ching Chou

Research output: Contribution to journal › Article › peer-review

Abstract

The nanotribological properties of Zn_0.75Mg_0.25O grown on R-plane sapphire using metal-organic vapor-phase epitaxy at different substrate temperatures (RT, 600, 700 and 800 °C) were investigated. A slight sliding track was observed at ramped loads of 250 μN, and an obvious bulge edge surrounding the groove was observed at ramped loads of 1 000 μN. Because of the annealing treatment, all the Zn_0.75Mg_0.25O coatings showed a reconstruction phenomenon of crystallites. The volumes of the bulge edges were as high as 30% in the annealed specimens and were larger than the volumes of the RT-treated specimens when ramped loads of 1 000 μN were applied. Under frictional loading, atomic force microscopy examination of scratch-tested films indicated lower bonding forces on R-plane sapphire than M-plane sapphire.

Original language	English
Pages (from-to)	158-163
Number of pages	6
Journal	International Journal of Materials Research
Volume	112
Issue number	2
DOIs	https://doi.org/10.1515/ijmr-2020-7766
State	Published - 1 Feb 2021

Keywords

Friction
Metal-organic vapor phase epitaxy
Nanoscratch

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title = "Annealing effect of scratch characteristics of ZnMgO epilayers on R-plane sapphire",

abstract = "The nanotribological properties of Zn0.75Mg0.25O grown on R-plane sapphire using metal-organic vapor-phase epitaxy at different substrate temperatures (RT, 600, 700 and 800 °C) were investigated. A slight sliding track was observed at ramped loads of 250 μN, and an obvious bulge edge surrounding the groove was observed at ramped loads of 1 000 μN. Because of the annealing treatment, all the Zn0.75Mg0.25O coatings showed a reconstruction phenomenon of crystallites. The volumes of the bulge edges were as high as 30% in the annealed specimens and were larger than the volumes of the RT-treated specimens when ramped loads of 1 000 μN were applied. Under frictional loading, atomic force microscopy examination of scratch-tested films indicated lower bonding forces on R-plane sapphire than M-plane sapphire.",

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T1 - Annealing effect of scratch characteristics of ZnMgO epilayers on R-plane sapphire

AU - Wen, Hua Chiang

AU - Hsieh, Ming Chu

AU - Lan, Yu-Pin

AU - Chou, Wu-Ching

PY - 2021/2/1

Y1 - 2021/2/1

N2 - The nanotribological properties of Zn0.75Mg0.25O grown on R-plane sapphire using metal-organic vapor-phase epitaxy at different substrate temperatures (RT, 600, 700 and 800 °C) were investigated. A slight sliding track was observed at ramped loads of 250 μN, and an obvious bulge edge surrounding the groove was observed at ramped loads of 1 000 μN. Because of the annealing treatment, all the Zn0.75Mg0.25O coatings showed a reconstruction phenomenon of crystallites. The volumes of the bulge edges were as high as 30% in the annealed specimens and were larger than the volumes of the RT-treated specimens when ramped loads of 1 000 μN were applied. Under frictional loading, atomic force microscopy examination of scratch-tested films indicated lower bonding forces on R-plane sapphire than M-plane sapphire.

AB - The nanotribological properties of Zn0.75Mg0.25O grown on R-plane sapphire using metal-organic vapor-phase epitaxy at different substrate temperatures (RT, 600, 700 and 800 °C) were investigated. A slight sliding track was observed at ramped loads of 250 μN, and an obvious bulge edge surrounding the groove was observed at ramped loads of 1 000 μN. Because of the annealing treatment, all the Zn0.75Mg0.25O coatings showed a reconstruction phenomenon of crystallites. The volumes of the bulge edges were as high as 30% in the annealed specimens and were larger than the volumes of the RT-treated specimens when ramped loads of 1 000 μN were applied. Under frictional loading, atomic force microscopy examination of scratch-tested films indicated lower bonding forces on R-plane sapphire than M-plane sapphire.

KW - Friction

KW - Metal-organic vapor phase epitaxy

KW - Nanoscratch

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JO - International Journal of Materials Research

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Annealing effect of scratch characteristics of ZnMgO epilayers on R-plane sapphire

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Keywords

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