Anchoring energy enhancement for plasma alignment technology

Chih Yi Hsu, Tse Hsien Lee, Huang-Ming Chen, Hui Chien J. Kuo, Yi Fan Chen, Chin Yang Lee, Yin Chang Lin, Yao Jane Hsu

Research output: Contribution to journalConference articlepeer-review


The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.

Original languageAmerican English
Pages (from-to)1634-1636
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Issue number1
StatePublished - 2009
Event2009 Vehicles and Photons Symposium - Dearborn, MI, United States
Duration: 15 Oct 200916 Oct 2009


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