The oxygen plasma post-treatment was adopted for alignment preparation in Ar plasma alignment process. The light leakage at the dark state was suppressed by the new treatment. The NEXAFS data suggested that the out of plane carbonyl groups have been regenerated under oxygen plasma post-treatment. The polar anchoring energy was two times increased comparing to the Ar treated PI. The cell’s EO properties by new plasma treatment were comparable to the rubbed PI surface.
|Original language||American English|
|Number of pages||3|
|Journal||Digest of Technical Papers - SID International Symposium|
|State||Published - 1 Jan 2009|
|Event||2009 Vehicles and Photons Symposium - Dearborn, MI, United States|
Duration: 15 Oct 2009 → 16 Oct 2009