Analysis of demand patterns on demand-pull replenishment application

Edwin D. Liou; Chia Pin Wen; Hsin Feng Tsai; Chi Sheng Shi; Kun Tung Hung; Yung-Chia Chang; Yi Chieh Lei

Analysis of demand patterns on demand-pull replenishment application

Edwin D. Liou^*, Chia Pin Wen, Hsin Feng Tsai, Chi Sheng Shi, Kun Tung Hung, Yung-Chia Chang, Yi Chieh Lei

^*Corresponding author for this work

Department of Industrial Engineering and Management

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

• Conclusions - Demand patterns do affect the effectiveness of demand-pull replenishment - Provide a tool to determine if demand-pull replenishment is workable for a certain product as long as at least 30 weeks of historical demand are available • Future Research - Consider more factors: seasonality, product life cycle stage, product face in/out, etc. - Analyze data from other industrial sectors.

Original language	English
Title of host publication	2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011
Pages	1-12
Number of pages	12
State	Published - 5 Sep 2011
Event	2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011 - Hsinchu, Taiwan Duration: 5 Sep 2011 → 6 Sep 2011

Publication series

Name	IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
ISSN (Print)	1523-553X

Conference

Conference	2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011
Country/Territory	Taiwan
City	Hsinchu
Period	5/09/11 → 6/09/11

Cite this

Liou, E. D., Wen, C. P., Tsai, H. F., Shi, C. S., Hung, K. T., Chang, Y.-C., & Lei, Y. C. (2011). Analysis of demand patterns on demand-pull replenishment application. In 2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011 (pp. 1-12). Article 6086040 (IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings).

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title = "Analysis of demand patterns on demand-pull replenishment application",

abstract = "• Conclusions - Demand patterns do affect the effectiveness of demand-pull replenishment - Provide a tool to determine if demand-pull replenishment is workable for a certain product as long as at least 30 weeks of historical demand are available • Future Research - Consider more factors: seasonality, product life cycle stage, product face in/out, etc. - Analyze data from other industrial sectors.",

author = "Liou, {Edwin D.} and Wen, {Chia Pin} and Tsai, {Hsin Feng} and Shi, {Chi Sheng} and Hung, {Kun Tung} and Yung-Chia Chang and Lei, {Yi Chieh}",

year = "2011",

month = sep,

day = "5",

language = "English",

isbn = "9781457716478",

series = "IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings",

pages = "1--12",

booktitle = "2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011",

note = "2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011 ; Conference date: 05-09-2011 Through 06-09-2011",

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Liou, ED, Wen, CP, Tsai, HF, Shi, CS, Hung, KT, Chang, Y-C & Lei, YC 2011, Analysis of demand patterns on demand-pull replenishment application. in 2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011., 6086040, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, pp. 1-12, 2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011, Hsinchu, Taiwan, 5/09/11.

Analysis of demand patterns on demand-pull replenishment application. / Liou, Edwin D.; Wen, Chia Pin; Tsai, Hsin Feng et al.
2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011. 2011. p. 1-12 6086040 (IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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T1 - Analysis of demand patterns on demand-pull replenishment application

AU - Liou, Edwin D.

AU - Wen, Chia Pin

AU - Tsai, Hsin Feng

AU - Shi, Chi Sheng

AU - Hung, Kun Tung

AU - Chang, Yung-Chia

AU - Lei, Yi Chieh

PY - 2011/9/5

Y1 - 2011/9/5

N2 - • Conclusions - Demand patterns do affect the effectiveness of demand-pull replenishment - Provide a tool to determine if demand-pull replenishment is workable for a certain product as long as at least 30 weeks of historical demand are available • Future Research - Consider more factors: seasonality, product life cycle stage, product face in/out, etc. - Analyze data from other industrial sectors.

AB - • Conclusions - Demand patterns do affect the effectiveness of demand-pull replenishment - Provide a tool to determine if demand-pull replenishment is workable for a certain product as long as at least 30 weeks of historical demand are available • Future Research - Consider more factors: seasonality, product life cycle stage, product face in/out, etc. - Analyze data from other industrial sectors.

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M3 - Conference contribution

AN - SCOPUS:83755178355

SN - 9781457716478

T3 - IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

SP - 1

EP - 12

BT - 2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011

T2 - 2011 e-Manufacturing and Design Collaboration Symposium, eMDC 2011 and International Symposium on Semiconductor Manufacturing, ISSM 2011

Y2 - 5 September 2011 through 6 September 2011

ER -

Liou ED, Wen CP, Tsai HF, Shi CS, Hung KT, Chang YC et al. Analysis of demand patterns on demand-pull replenishment application. In 2011 e-Manufacturing and Design Collaboration Symposium and International Symposium on Semiconductor Manufacturing, eMDC and ISSM 2011. 2011. p. 1-12. 6086040. (IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings).

Analysis of demand patterns on demand-pull replenishment application

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