An optimum design of the micromachined RF inductor

Jr Wei Lin*, C. C. Chen, J. K. Huang, Yu-Ting Cheng

*Corresponding author for this work

    Research output: Contribution to conferencePaperpeer-review

    3 Scopus citations

    Abstract

    With a complete performance investigation of the on-chip micromachined inductor with mechanical disturbances using ANSYS and HFSS simulators, an optimum structural design of the micromachined spiral inductors with fully CMOS compatible post-processes for RFIC applications is proposed in this paper. Via the incorporation of a sandwich dielectric membrane (0.7μm SiO 2 / 0.7μm Si 3 N 4 / 0.7μm TEOS) to enhance the structure rigidity, the inductor can have better signal stability. As compared, the new design of a 5nH micromachined inductor can have less 45% inductance variation than the conventional one while both devices operate at SGHz but with 10 m/sec 2 acceleration. Meanwhile, using a cross shape instead of blanket membrane can also effectively eliminate the inductance variation induced by the working temperature change (20°C to 75°C). It's our belief that the new micromachined inductors can have not only high Q performance but also better signal stability suitable for wide range RFIC applications.

    Original languageEnglish
    Pages639-642
    Number of pages4
    DOIs
    StatePublished - Jun 2004
    EventDigest of Papers - 2004 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium - Fort Worth, TX, United States
    Duration: 6 Jun 20048 Jun 2004

    Conference

    ConferenceDigest of Papers - 2004 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium
    Country/TerritoryUnited States
    CityFort Worth, TX
    Period6/06/048/06/04

    Keywords

    • Mechanical Disturbance
    • Micromachined Inductor
    • Optimum Design
    • RFIC
    • Signal Stability

    Fingerprint

    Dive into the research topics of 'An optimum design of the micromachined RF inductor'. Together they form a unique fingerprint.

    Cite this