An Improved Meta Learning Approach for Optimizing Recipe Parameters for Semiconductor Processes

Zhen Yin Annie Chen, Chun Cheng Lin, Ke Wen Lu, Hui Hsin Chin, Der Jiunn Deng*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

It has been challenging to find the optimal recipe parameters for semiconductor processes to find a balance between budgets and computing efficiency. Therefore, this study focuses on finding the optimal recipe parameters of a semiconductor process using an improves meta Bayesian optimization (MetaBO) method, which can be trained with extremely few samples and historical data so as to quickly find the optimal process parameter combinations for the product. Experimental results show that the improved MetaBO significantly improves overall quality and efficiency in both model training and new task evaluation.

Original languageEnglish
Title of host publicationIECON 2023 - 49th Annual Conference of the IEEE Industrial Electronics Society
PublisherIEEE Computer Society
ISBN (Electronic)9798350331820
DOIs
StatePublished - 2023
Event49th Annual Conference of the IEEE Industrial Electronics Society, IECON 2023 - Singapore, Singapore
Duration: 16 Oct 202319 Oct 2023

Publication series

NameIECON Proceedings (Industrial Electronics Conference)
ISSN (Print)2162-4704
ISSN (Electronic)2577-1647

Conference

Conference49th Annual Conference of the IEEE Industrial Electronics Society, IECON 2023
Country/TerritorySingapore
CitySingapore
Period16/10/2319/10/23

Keywords

  • Bayesian optimization
  • chemical vapor deposition process
  • process recipe parameters

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