An All-Region BSIM Thin-Film Transistor Model for Display and BEOL 3-D Integration Applications

Girish Pahwa*, Sayeef Salahuddin, Chenming Hu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

This article introduces a compact model for single-gate and multigate thin-film transistors (TFTs) based on the Berkeley short-channel IGFET model-common multiple gate (BSIM-CMG) framework, valid in all regions of TFT operation. We develop a model for the channel charge density, including the impact of traps in the amorphous/polycrystalline channel of TFT, based on a linear potential profile approximation along the gate-normal direction. We further develop explicit, charge-based compact models for current and terminal charges. Unlike previous models, this model implicitly includes the impact of trap-limited conduction mechanism. In addition, we include the impact of Schottky source/drain contact resistances and temperature dependencies. The model is carefully validated with published experimental data of TFTs using diverse channel materials, including oxide semiconductors (OSs) and poly-Si, and various geometries, spanning applications in displays and emerging 3-D back-end-of-line (BEOL) integration scenarios.

Original languageEnglish
Pages (from-to)4701-4709
Number of pages9
JournalIEEE Transactions on Electron Devices
Volume71
Issue number8
DOIs
StatePublished - 2024

Keywords

  • All-region compact model
  • Berkeley short-channel IGFET model (BSIM)
  • TFT
  • back-end-of-line (BEOL) 3-D integration
  • display thin-film transistor (TFT)
  • field effect mobility
  • oxide semiconductors (OSs) Schottky contact resistance
  • trap limited conduction (TLC)

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