Advanced nano-devices produced by high-performance plasma etching processes

Seiji Samukawa*

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

Original languageEnglish
Pages (from-to)993-998
Number of pages6
JournalJournal of the Japan Society for Precision Engineering
Volume73
Issue number9
DOIs
StatePublished - 2007

Keywords

  • High density plasma
  • Nanodevices
  • Neutral beam
  • Radiation damage
  • Super-fine etching technology
  • ULSI

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