A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

Bing Rui Lu, Yifang Chen*, Shao Wei Wang, Ejaz Huq, Edward Rogers, Tsung-Sheng Kao, Xin Ping Qu, Ran Liu, Nikolay I. Zheludev

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

Original languageEnglish
Pages (from-to)1506-1508
Number of pages3
JournalMicroelectronic Engineering
Issue number5-8
StatePublished - 1 May 2010


  • Electron beam lithography
  • Nanofabrication
  • Nanolens
  • Self-aligned nanolithography
  • Wet/dry etching


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