A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

Bing Rui Lu; Yifang Chen; Shao Wei Wang; Ejaz Huq; Edward Rogers; Tsung-Sheng Kao; Xin Ping Qu; Ran Liu; Nikolay I. Zheludev

doi:10.1016/j.mee.2009.11.064

A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

Bing Rui Lu, Yifang Chen^*, Shao Wei Wang, Ejaz Huq, Edward Rogers, Tsung-Sheng Kao, Xin Ping Qu, Ran Liu, Nikolay I. Zheludev

^*Corresponding author for this work

Department of Photonics

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

Original language	English
Pages (from-to)	1506-1508
Number of pages	3
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.11.064
State	Published - 1 May 2010

Keywords

Electron beam lithography
Nanofabrication
Nanolens
Self-aligned nanolithography
Wet/dry etching

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10.1016/j.mee.2009.11.064

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title = "A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography",

abstract = "In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.",

keywords = "Electron beam lithography, Nanofabrication, Nanolens, Self-aligned nanolithography, Wet/dry etching",

author = "Lu, {Bing Rui} and Yifang Chen and Wang, {Shao Wei} and Ejaz Huq and Edward Rogers and Tsung-Sheng Kao and Qu, {Xin Ping} and Ran Liu and Zheludev, {Nikolay I.}",

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T1 - A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

AU - Lu, Bing Rui

AU - Chen, Yifang

AU - Wang, Shao Wei

AU - Huq, Ejaz

AU - Rogers, Edward

AU - Kao, Tsung-Sheng

AU - Qu, Xin Ping

AU - Liu, Ran

AU - Zheludev, Nikolay I.

PY - 2010/5/1

Y1 - 2010/5/1

N2 - In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

AB - In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.

KW - Electron beam lithography

KW - Nanofabrication

KW - Nanolens

KW - Self-aligned nanolithography

KW - Wet/dry etching

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SP - 1506

EP - 1508

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

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Keywords

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