Abstract
In this paper, a new depletion-load metal oxide-based inverter with 3-D structure is realized with film-profile-engineered InGaZnO (IGZO) thin-film transistors (TFTs). The proposed inverter possesses vertically stacked load and drive TFTs whose threshold voltage can be flexibly adjusted into a wide range of -2.3-1 V through merely adjusting the geometric parameters without the necessity of additional processes or masks. The 3-D IGZO inverters constructed through the proposed technology demonstrate full-swing switching with voltage gains up to 19 V/V under an operation voltage of 9 V. The 3-D inverters can not only reduce the footprint but also promote the resistance toward light-induced instability.
Original language | English |
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Article number | 7508409 |
Pages (from-to) | 3533-3539 |
Number of pages | 7 |
Journal | IEEE Transactions on Electron Devices |
Volume | 63 |
Issue number | 9 |
DOIs | |
State | Published - Sep 2016 |
Keywords
- Film profile engineering (FPE)
- InGaZnO (IGZO)
- inverter
- logic gate
- metal oxide (MO)
- thin-film transistors (TFTs)
- voltage gain