A comprehensive study of hot carrier stress-induced drain leakage current degradation in thin-oxide n-MOSFET's

Ta-Hui Wang*, Lu Ping Chiang, Nian Kai Zous, Charng Feng Hsu, Li Yuan Huang, Tien-Sheng Chao

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

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Engineering & Materials Science

Chemical Compounds