A Compact Model of Ferroelectric Field-effect Transistor

Chien Ting Tung, Girish Pahwa, Sayeef Salahuddin, Chenming Hu

Research output: Contribution to journalArticlepeer-review


In this paper, we present a compact model of ferroelectric field-effect-transistor (FEFET). The model consists of a ferroelectric (FE) capacitor model and a Berkeley Short-channel IGFET Model (BSIM), a standard SPICE MOSFET model. The FE model, similar to the nucleation-limited-switching model, is based on the statistical multidomain dynamics of FE materials. The charge equality between FE and MOSFET is satisfied through the SPICE simulator. The model reproduces the steep switching in the reverse bias region observed in experimental FEFETs and the current drop at both major loop and minor loop switching. A versatile inverted-memory-window (IMW) model can model the IMW behavior of FEFET that may be caused by charge trapping. We demonstrate that the reported model can accurately fit the published data of Fin-FEFET and FDSOI-FEFET under different bias conditions.

Original languageEnglish
Pages (from-to)1
Number of pages1
JournalIeee Electron Device Letters
StateAccepted/In press - 2022


  • Compact model
  • Computational modeling
  • FeFETs
  • ferroelectric
  • ferroelectric field-effect transistor (FEFET)
  • hafnium zirconium oxide (HZO)
  • Integrated circuit modeling
  • Iron
  • Semiconductor device modeling
  • Switches


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