@inproceedings{9d2d3ad9db9a469f8872aaafe1656ab5,
title = "A CMOS micromachined capacitive tactile sensor with compensation of process variations",
abstract = "This paper presents a standard-CMOS-fabricated capacitive tactile sensor with high sensitivity and a sensing circuit with compensation of process variations. Both of the sensor and sensing circuit are fabricated on a single chip by a TSMC 0.35μm CMOS MEMS technology. In order to create high sensitivity of the sensor for sensing circuit, a T-shaped protrusion is proposed. This sensor is constituted by the metal layer and the dielectric layer without extra thin film deposition, and can be completed with few simple post-processing steps. With the fully differential correlated double sampling capacitor-to-voltage converter (CDS-CVC) and reference capacitor correction, process variations are compensated. The measured sensitivity of the sensing circuit is 18mV/fF.",
author = "Tsai, {Hao Cheng} and Wu, {Tien Keng} and Tsai, {Tsung Heng}",
year = "2013",
doi = "10.1109/BioCAS.2013.6679709",
language = "English",
isbn = "9781479914715",
series = "2013 IEEE Biomedical Circuits and Systems Conference, BioCAS 2013",
pages = "342--345",
booktitle = "2013 IEEE Biomedical Circuits and Systems Conference, BioCAS 2013",
note = "null ; Conference date: 31-10-2013 Through 02-11-2013",
}