A 1700 V-Class Self-Aligned Channel and Split Gate (SASG) Architecture of 4H-SiC VDMOSFET for High Frequency Application

Chia Lung Hung*, Yi Kai Hsiao, Hao Chung Kuo

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Simulation of a 1700 V 4H-SiC VDMOSFET with self-aligned channel and split gate (SASG) architecture for high frequency switching performance is reported. An innovative process flow to fabricate the 1700 V SASG VDMOSFET is proposed at first time and the DC and AC characteristics of the proposed SASG VDMOSFET are compared with conventional VDMOSFET through TCAD (Technology Computer Aided Design) simulation. The gate charge, switching delay time and input capacitance have been improved 32%, 45% and 28% on the SASG VDMOSFET, respectively without sacrificing DC characteristics.

Original languageEnglish
Title of host publicationWiPDA Asia 2023 - IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350337112
DOIs
StatePublished - 2023
Event2023 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia, WiPDA Asia 2023 - Hsinchu, Taiwan
Duration: 27 Aug 202329 Aug 2023

Publication series

NameWiPDA Asia 2023 - IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia

Conference

Conference2023 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia, WiPDA Asia 2023
Country/TerritoryTaiwan
CityHsinchu
Period27/08/2329/08/23

Keywords

  • Self-aligned channel
  • Silicon Carbide
  • Split gate
  • VDMOSFET

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