27.3: Horizontal Chevron defect free half-V mode ferroelectric liquid crystal devices based on asymmetrical hybrid alignment techniques

Chi Wen Lin*, Chih I. Hsu, Chia Huang Liao, Huang-Ming Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Base on FLC free energy, the asymmetrical alignment techniques were proposed to suppress the alignment defects of half-V mode ferroelectric liquid crystal (HV-FLC) devices. Alignment layers with opposite surface polarities and different anchoring energies were applied to controlled the sign and value of polar surface coefficient (γ 2 ), respectively. The asymmetrical cells of PI rub-PI plasma (rubbed polyimide (PI) and plasma treated PI surfaces), PVA rub-PI plasma (rubbed polyvinyl alcohol (PVA) and plasma treated PI surfaces), and PVA rub-PI rub (both rubbed PI and PVA) alignment conditions present mono-domain alignment textures under slow cooling process. Among these alignment pairs, the PVA rub-PI rub treated cell, with larger difference in γ 2 values, appeared to have better alignment. A 2.4″ prototype TFT-LCD was presented by PVA rub-PI rub treated surfaces.

Original languageEnglish
Pages (from-to)391-393
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume41 1
DOIs
StatePublished - 1 May 2010

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