200mm GaN-on-Si E-Mode Power HEMTs with Epitaxially Grown p-AlN/p-GaN Gate to Enhance Gate Reliability

Zhen Hong Huang, Chia Hao Chang, Ting Chun Lo, Yu Ting Lee, Chih Hung Lu, Hung En Wang, Yi He Tsai, Ying Chi Cheng, Yu Jen Huang, Chin Wen Chou, Tian Li Wu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

E-mode power HEMTs with epitaxially grown p-AlN/p-GaN gate are demonstrated for the first time to enhance the gate reliability, including the positive bias temperature instability (PBTI), time-dependent gate breakdown, and the high-temperature gate bias (HTGB). Furthermore, the electroluminescence (EL) emission is conducted to evaluate the electrons-holes recombination through the Magnesium acceptor and deep-level donor in the p-AlN layer, and the TCAD simulations indicate that the hole barrier tunneling can be reduced from the Schottky metal/p-AlN/p-GaN interfaces by using epitaxially grown p-AlN/p-GaN gate stack.

Original languageEnglish
Title of host publication2024 36th International Symposium on Power Semiconductor Devices and ICs, ISPSD 2024 - Conference Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages319-322
Number of pages4
ISBN (Electronic)9798350394825
DOIs
StatePublished - 2024
Event36th International Symposium on Power Semiconductor Devices and ICs, ISPSD 2024 - Bremen, Germany
Duration: 2 Jun 20246 Jun 2024

Publication series

NameProceedings of the International Symposium on Power Semiconductor Devices and ICs
ISSN (Print)1063-6854

Conference

Conference36th International Symposium on Power Semiconductor Devices and ICs, ISPSD 2024
Country/TerritoryGermany
CityBremen
Period2/06/246/06/24

Keywords

  • Electroluminescence
  • HTRB
  • TDGB
  • p-AlN
  • p-GaN HEMT

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