Keyphrases
Neutral Beam
100%
Neutral Beam Etching
93%
Time-modulated
51%
Etching Process
48%
Pulse Time
45%
Nanodiscs
39%
Damage-free
36%
Ultra-high Frequency
34%
Biotemplate
31%
Plasma Etching
30%
Gallium Arsenide
27%
Electron Cyclotron Resonance Plasma
27%
Silica
25%
High Performance
21%
High Density
21%
Si Nanodisk
21%
Etching Rate
21%
Low Temperature
20%
Nanodisk Array
19%
Plasma Process
18%
Negative Ions
18%
On-wafer
18%
Nanodevices
16%
Highly Selective
16%
SiO2 Etching
16%
Plasma Etching Process
15%
Radiation Damage
14%
Electron Cyclotron Resonance
14%
CF3I
14%
Electron Temperature
13%
Quantum Nanodisk
13%
Low Damage
13%
Plasma Sources
13%
Beams Process
12%
Etch Characteristics
12%
Room Temperature
12%
Ferritin
11%
Sidewall
11%
Inductively Coupled Plasma
11%
Contact Holes
11%
Gas Chemistry
11%
Charge Accumulation
11%
Plasma Discharge
11%
Fin Field-effect Transistor (FinFET)
11%
Etch Profile
11%
Etching Technology
11%
High-density Plasma
10%
Photoluminescence
10%
High Efficiency
10%
Miniband
9%
Material Science
Surface (Surface Science)
61%
Density
57%
Film
56%
Silicon
53%
Plasma Etching
51%
Oxide Compound
25%
Quantum Dot
22%
Oxidation Reaction
22%
Nanodevice
20%
Gallium Arsenide
20%
Photoluminescence
18%
Solar Cell
18%
Transistor
14%
Ferritin
13%
Reactive Ion Etching
11%
Superlattice
11%
Electronic Circuit
11%
Graphene
11%
Germanium
10%
Light-Emitting Diode
10%
Electron Mobility
10%
Dielectric Material
10%
Field Effect Transistor
10%
Nanostructure
10%
Polymerization
9%
Metal-Oxide-Semiconductor Field-Effect Transistor
9%
Silicon Dioxide
9%
Chemical Vapor Deposition
9%
Surface Modification
8%
Semiconductor Device
8%
Annealing
8%
Thin Films
7%
Thermal Conductivity
7%
Anisotropic Etching
6%
Lithography
6%
Aluminium Gallium Arsenide
5%
Quantum Well
5%
Plasma Density
5%
Activation Energy
5%
Iron Oxide
5%
Emission Spectroscopy
5%
Metal Oxide
5%
Oxide Film
5%
Carrier Concentration
5%
Radiation Damage
5%
Nanowire
5%
Engineering
Silicon Dioxide
23%
Etching Process
22%
Low-Temperature
18%
Plasma Process
17%
Gallium Arsenide
17%
Quantum Dot
17%
Solar Cell
15%
Side Wall
12%
Induced Damage
12%
Polysilicon
12%
Electron Energy
11%
Metal-Oxide-Semiconductor Field-Effect Transistor
11%
Inductively Coupled Plasma
11%
Plasma Source
10%
Nanomaterial
10%
Chemical Vapor Deposition
10%
Atomic Layer
9%
Interface State
9%
Field-Effect Transistor
9%
Room Temperature
8%
Vapor Deposition
8%
Superlattice
8%
Semiconductor Device
8%
Graphene
8%
High Aspect Ratio
7%
Dimensional Array
7%
Dielectrics
7%
Nanoscale
7%
Nanopillar
7%
down Process
7%
Plasma Applications
6%
Thin Films
6%
Interlayer
6%
Radio Frequency
6%
Gate Oxide
6%
Ion Density
6%
Two Dimensional
6%
Absorptivity
6%
Light-Emitting Diode
6%
Radiation Effect
5%
Anisotropic
5%
Substrate Temperature
5%
Microcantilevers
5%
Energy Distribution
5%
Nanofabrication Process
5%
Oxide Film
5%
Cyclotron Resonance
5%
