Keyphrases
Light-emitting Diodes
68%
Indium Gallium Nitride (InGaN)
42%
Metal-organic Chemical Vapor Deposition (MOCVD)
34%
Epilayer
30%
Sapphire Substrate
25%
Sapphire
24%
GaN-based Light-emitting Diodes
22%
AlGaInP
21%
Ga2O3
18%
GaN-based LED
18%
Power Output
15%
ZnGa2O4
15%
Patterned Sapphire Substrate
15%
Light Output
13%
Micro-light-emitting Diodes (micro-LEDs)
13%
Wafer
13%
Indium Tin Oxide
12%
Light Extraction
11%
Si Substrate
11%
High Power
11%
Injection Current
11%
Wafer Bonding
10%
Gallium Arsenide
9%
Laser Lift-off
9%
Solar Cell
9%
Electrical Properties
9%
Surface Texture
8%
Performance Improvement
8%
External Quantum Efficiency
8%
High Performance
8%
Aluminum Gallium Nitride (AlGaN)
8%
Annealing
7%
GaAs Substrate
7%
GaN Epilayer
7%
Heat Spreader
7%
Crystal Quality
7%
P-GaN
7%
Pulsed Laser Deposition
7%
Diode Application
7%
RCLED
7%
Sacrificial Layer
6%
Optical Properties
6%
Cu Substrate
6%
Oxides
6%
Flip chip
5%
High Efficiency
5%
LED Application
5%
Flip-chip Light-emitting Diode
5%
Undoped
5%
Silica
5%
Material Science
Light-Emitting Diode
100%
Sapphire
53%
Thin Films
48%
Film
40%
Epilayers
39%
Chemical Vapor Deposition
29%
Surface (Surface Science)
24%
Solar Cell
15%
Density
15%
Silicon
14%
Indium Tin Oxide
14%
Gallium Arsenide
14%
Oxide Compound
11%
ZnO
11%
Annealing
10%
Photoluminescence
9%
Metal-Organic Chemical Vapor Deposition
9%
Transistor
8%
Heterojunction
7%
Zinc Oxide
7%
Gallium
6%
Indium
6%
Electronic Circuit
6%
Pulsed Laser Deposition
6%
Electrical Resistivity
6%
Thermal Stability
5%
Aluminum
5%
Epitaxial Film
5%
Optical Property
5%
Engineering
Light-Emitting Diode
95%
Thin Films
38%
Sapphire Substrate
25%
Chemical Vapor Deposition
25%
Vapor Deposition
23%
Output Power
20%
Current Injection
18%
Solar Cell
18%
Light Extraction
14%
Indium-Tin-Oxide
12%
Wafer Bonding
12%
External Quantum Efficiency
11%
Gallium Arsenide
11%
Light Output Power
10%
Nitride
10%
Si Substrate
8%
Heat Losses
7%
Gaas Substrate
7%
Conductive
6%
Resonant Cavity
6%
Textured Surface
6%
Low-Temperature
6%
Metal Organic Chemical Vapor Deposition
6%
Silicon Dioxide
5%
Optoelectronics
5%
Pulsed Laser
5%
Phase Composition
5%
Ultraviolet Light
5%