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PhD, Electronics, National Chiao Tung University
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三維堆疊奈米互補式場效電晶體與記憶體元件之研製
1/08/22 → 31/07/23
Project: Government Ministry › Other Government Ministry Institute
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臺日(JP)雙邊協議型擴充加值(add-on) 國際合作研究計畫-奈米級鐵電電晶體之研究開發及其在機器學習加速器之應用
1/04/22 → 31/03/23
Project: Government Ministry › Other Government Ministry Institute
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三維堆疊奈米互補式場效電晶體與記憶體元件之研製
1/08/23 → 31/07/24
Project: Government Ministry › Other Government Ministry Institute
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三維堆疊奈米互補式場效電晶體與記憶體元件之研製
1/08/21 → 31/07/22
Project: Government Ministry › Other Government Ministry Institute
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臺日(JP)雙邊協議型擴充加值(add-on) 國際合作研究計畫-奈米級鐵電電晶體之研究開發及其在機器學習加速器之應用
1/04/21 → 31/03/22
Project: Government Ministry › Other Government Ministry Institute
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Monolithic 3D integration of back-end compatible 2D material FET on Si FinFET
Guan, S. X., Yang, T. H., Yang, C. H., Hong, C. J., Liang, B. W., Simbulan, K. B., Chen, J. H., Su, C. J., Li, K. S., Zhong, Y. L., Li, L. J. & Lan, Y. W., Dec 2023, In: npj 2D Materials and Applications. 7, 1, 9.Research output: Contribution to journal › Article › peer-review
Open Access -
3D Monolithic Stacking of Complementary-FET on CMOS for Next Generation Compute-In-Memory SRAM
Baig, M. A., Yeh, C. J., Chang, S. W., Qiu, B. H., Huang, X. S., Tsai, C. H., Chang, Y. M., Sung, P. J., Su, C. J., Cho, T. C., De, S., Lu, D., Lee, Y. J., Lee, W. H., Wu, W. F. & Yeh, W-K., 2022, (Accepted/In press) In: IEEE Journal of the Electron Devices Society. p. 1 1 p.Research output: Contribution to journal › Article › peer-review
Open Access -
Demonstration of synaptic characteristics of polycrystalline-silicon ferroelectric thin-film transistor for application of neuromorphic computing
Ma, W. C. Y., Su, C. J., Lee, Y. J., Kao, K. H., Chang, T. H., Chang, J. C., Wu, P. H., Yen, C. L. & Lin, J. H., 1 Apr 2022, In: Semiconductor Science and Technology. 37, 4, 045003.Research output: Contribution to journal › Article › peer-review
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Effects of Annealing Temperature on TiN/Hf0.5Zr0.5O2/TiN Ferroelectric Capacitor Prepared by <italic>In-situ</italic> like Consecutive Atomic Layer Deposition
Liang, Y. K., Huang, Y. S., Peng, L. C., Yang, T. Y., Young, B. F., Lu, C. C., Yeong, S. H., Lin, Y. M., Su, C. J., Chang, E. Y. & Lin, C. H., 2022, (Accepted/In press) In: IEEE Transactions on Nanotechnology. p. 1-4 4 p.Research output: Contribution to journal › Article › peer-review
2 Scopus citations -
Efficient Erase Operation by GIDL Current for 3D Structure FeFETs with Gate Stack Engineering and Compact Long-Term Retention Model
Mo, F., Xiang, J., Mei, X., Sawabe, Y., Saraya, T., Hiramoto, T., Su, C. J., Hu, V. P. H. & Kobayashi, M., 2022, In: IEEE Journal of the Electron Devices Society. 10, p. 115-122 8 p.Research output: Contribution to journal › Article › peer-review
Open Access2 Scopus citations