Calculated based on number of publications stored in Pure and citations from Scopus
Calculated based on number of publications stored in Pure and citations from Scopus
Calculated based on number of publications stored in Pure and citations from Scopus
1992 …2023

Research activity per year

If you made any changes in Pure these will be visible here soon.

Network

G. E. Stillman

  • California Institute of Technology
  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department
  • Univ. Illinois at Urbana-Champaign
  • CCEEL
  • Department of Materials Science and Engineering
  • Depament of Electrical and Computer Engineering
  • Dept. of Mat. Sci. and Engineering

External person

Yan Kui Liang

  • National Yang Ming Chiao Tung University

External person

C. H. Diaz

  • Advanced Device Technology Department
  • Taiwan Semiconductor Manufacturing Company
  • IEEE
  • Device Technology and Modeling Department
  • Research and Development
  • SBIP

External person

Y. C. Lin

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Department of Materials Science and Engineering
  • Institute of Materials Science and Engineering
  • Department of Material Science and Engineering
  • Nippon Telegraph & Telephone
  • Department of Electrical Engineering
  • Microelectronics and Information Systems Research Center
  • Taiwan Semiconductor Manufacturing Company
  • Integrated Interconnect and Packaging Division
  • Dept. of Matl. Sci. & Eng.

External person

Chun Chieh Lu

  • Taiwan Semiconductor Manufacturing Company

External person

Sai Hooi Yeong

  • Taiwan Semiconductor Manufacturing Company

External person

T. B. Wu

  • National Tsing Hua University
  • Department of Materials Science and Engineering
  • Department of Materials Science and Engineering
  • Department of Materials Science and Engineering
  • Department O Electronics Engineering
  • National Yang Ming Chiao Tung University
  • Department of Materials Science and Engineering
  • University of Illinois at Urbana-Champaign
  • Department of Materials Science and Engineering

External person

Mao Lin Huang

  • Taiwan Semiconductor Manufacturing Company

External person

Yi Shuo Huang

  • National Yang Ming Chiao Tung University
  • International College of Semiconductor Technology

External person

C. H. Ma

  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign
  • Department of Materials Science and Engineering
  • Department of Materials Science and Engineering

External person

J. M. Kuo

  • Lucent
  • Rutgers - The State University of New Jersey, New Brunswick
  • Lucent Technologies
  • Multiplex Inc.
  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Rutgers University

External person

A. P. Curtis

  • California Institute of Technology
  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department
  • Dept. of Mat. Sci. and Engineering
  • CCEEL

External person

P. A. Friddle

  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign
  • Department of Materials Science and Engineering
  • Dept. of Physics and Materials Sci.
  • City University of Hong Kong

External person

S. Thomas

  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department
  • CCEEL

External person

B. M. Yen

  • University of Illinois at Urbana-Champaign
  • Dept. of Mat. Sci. and Engineering
  • Department of Materials Science and Engineering
  • Texas Instruments

External person

Li Chi Peng

  • National Yang Ming Chiao Tung University

External person

Meng Ku Chen

  • Taiwan Semiconductor Manufacturing Company

External person

He Yong Hwang

  • Taiwan Semiconductor Manufacturing Company

External person

Jing Wei Lin

  • National Yang Ming Chiao Tung University

External person

Syun Ming Jang

  • Taiwan Semiconductor Manufacturing Company

External person

Chang Fu Dee

  • Institute of Micronengineering and Nanoelectronics (IMEN)
  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Universiti Kebangsaan Malaysia
  • Institute of Microengineering and Nanoelectronics
  • Institute of Microengineering and Nanoelectronics (IMEN)
  • Institute of Microengineering and Nanoelectronics
  • Institute of Microengineering and Nanoelectronics
  • Univ Kebangsaan Malaysia, Universiti Kebangsaan Malaysia, Inst Microengn & Nanoelect

External person

W. Wolbach

  • Department of Materials Science and Engineering
  • Northwestern University
  • The University of Chicago

External person

B. C. Moser

  • CCEEL
  • University of Illinois at Urbana-Champaign
  • Department of Materials Science and Engineering
  • RFMD Inc.

External person

Ya Ting Chang

  • National Yang Ming Chiao Tung University

External person

Chung Han Chiang

  • National Yang Ming Chiao Tung University

External person

Chang Hsien Lin

  • National Applied Research Laboratories Taiwan
  • National Nano Device Laboratories Taiwan
  • National Nano Device Laboratories (NDL
  • Taiwan Semiconductor Manufacturing Company
  • Stanford University

External person

Huai Ying Huang

  • Taiwan Semiconductor Manufacturing Company

External person

Y. Lu

  • Rutgers - The State University of New Jersey, New Brunswick
  • Electrical and Computer Engineering Department
  • United States Army Research Laboratory
  • Beijing Univ Technol, Beijing University of Technology, Inst Microstruct & Property Adv Mat
  • Rutgers University

External person

K. Y. Lee

  • Taiwan Semiconductor Manufacturing Company

External person

An Jye Tzou

  • National Nano Device Laboratories Taiwan
  • Department of Photonics and Institute of Electro-Optical Engineering
  • National Yang Ming Chiao Tung University
  • Department of Electrophysics
  • Department of Photonics
  • Inst. of Electro-Optical Engineering
  • Department of Photonics
  • National Applied Research Laboratories Taiwan
  • Taiwan Semiconductor Research Institute

External person

Yu Ming Lin

  • National Yang Ming Chiao Tung University
  • Taiwan Semiconductor Manufacturing Company

External person

Hui Chen Chang

  • Taiwan Semiconductor Manufacturing Company

External person

Bo Feng Young

  • Taiwan Semiconductor Manufacturing Company

External person

Ching Ting Lee

  • Yuan Ze University

External person

Lung Hsing Hsu

  • Industrial Technology Research Institute Hsinchu
  • National Yang Ming Chiao Tung University
  • Academia Sinica - Research Center for Applied Science
  • Acad Sinica, Academia Sinica - Taiwan, Res Ctr Appl Sci

External person

L. D. Marks

  • Department of Materials Science and Engineering
  • Northwestern University

External person

M. Dutta

  • Electronics and Power Sources Directorate
  • United States Army Research Laboratory
  • Rutgers - The State University of New Jersey, New Brunswick
  • U.S. Army ETDL
  • Rutgers University

External person

Simon M. Jang

  • Taiwan Semiconductor Manufacturing Company
  • Research and Development
  • SBIP

External person

Catherine Langpoklakpam

  • National Yang Ming Chiao Tung University

External person

Jia Hong Huang

  • Department of Engineering and System Science
  • National Tsing Hua University
  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign
  • National Taiwan University of Science and Technology
  • Department of Materials Science and Engineering
  • Department of Engineering

External person

Y. C. Yeo

  • National University of Singapore
  • Silicon Nano Device Laboratory
  • University of California at Berkeley
  • Department of Electrical Engineering and Computer Science
  • Taiwan Semiconductor Manufacturing Company
  • Department of EECS
  • Department of Electrical Engineering and Computer Sciences
  • Agency for Science, Technology and Research, Singapore
  • Department of Electrical Engineering and Computer Sciences
  • Department of Electrical Engineering and Computer Sciences
  • Silicon Nano Device Lab.
  • Department of Materials Science and Engineering
  • Silicon Nano Device Lab (SNDL)
  • Department of Electrical Engineering and Computer Science
  • IEEE
  • Technology
  • Department of Electrical Engineering and Computer Sciences
  • Silicon Nano Devices Laboratory
  • Department of Electrical Engineering
  • Silicon Nana Device Lab (SNDL)
  • Department of Electrical Engineering and Computer Sciences
  • Department of Electrical Engineering

External person

Chun Lin Chu

  • National Nano Device Laboratories Taiwan
  • Department of Electrical Engineering
  • National Taiwan University
  • Natl Appl Res Labs, National Applied Research Laboratories - Taiwan, Natl Nano Device Labs
  • Taiwan Semiconductor Manufacture Co.
  • National Applied Research Laboratories Taiwan
  • NARL

External person

C. T. Lee

  • Institute of Optical Sciences
  • National Central University
  • Institute of Microelectronics
  • National Cheng Kung University
  • Yuan Ze University
  • Department of Photonics Engineering
  • Department of Electrical Engineering
  • Institute of Microelectronics
  • Institute of Microelectronics
  • Department of Material Science and Engineering
  • National Yang Ming Chiao Tung University
  • Institute of Microelectronics
  • Department of Electrical Engineering
  • Institute of Optical Sciences
  • Institute of Optical Sciences

External person

Hung Ta Lin

  • Taiwan Semiconductor Manufacturing Company

External person

Z. C. Chen

  • Taiwan Semiconductor Manufacturing Company

External person

L. T. Lin

  • Taiwan Semiconductor Manufacturing Company

External person

R. Levi-Setti

  • Department of Materials Science and Engineering
  • Northwestern University
  • The University of Chicago

External person

Yu Chen

  • National Yang Ming Chiao Tung University

External person

T. Horton

  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department
  • Dept. of Mat. Sci. and Engineering

External person

S. W. Chang

  • Taiwan Semiconductor Manufacturing Company
  • TSMC R and D Europe B.V.

External person

Yu Wen Huang

  • National Yang Ming Chiao Tung University

External person

J. A. Eades

  • Department of Materials Science and Engineering
  • Northwestern University
  • Department of Metallurgy and Mining Engineering
  • University of Illinois at Urbana-Champaign

External person

Po Tsung Tu

  • Industrial Technology Research Institute Hsinchu
  • National Yang Ming Chiao Tung University

External person

H. Shen

  • United States Army Research Laboratory
  • Electronics and Power Sources Directorate
  • Rutgers - The State University of New Jersey, New Brunswick
  • U.S. Army ETDL
  • Rutgers University

External person

Yu Ming Lin

  • Taiwan Semiconductor Manufacturing Company

External person

W. F. Wu

  • National Nano Device Laboratories Taiwan
  • National Yang Ming Chiao Tung University
  • Hsinchu
  • Taiwan Semicond Res Inst
  • Taiwan Semiconductor Manufacture Co.
  • National Applied Research Laboratories Taiwan
  • NARL
  • National Tsing Hua University
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute (TSRI)
  • Taiwan Semiconductor Research Institute

External person

D. J. Li

  • Department of Materials Science and Engineering
  • Northwestern University

External person

Q. Yang

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Univ. Illinois at Urbana-Champaign

External person

Shih Chen Chen

  • Hon Hai Research Institute
  • Hon Hai Precision Industry

External person

Quang Ho Luc

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • International College of Semiconductor Technology

External person

G. L. Luo

  • National Nano Device Laboratories Taiwan
  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Microelectronics and Information Systems Research Center
  • National Applied Research Laboratories Taiwan
  • Department O Electronics Engineering
  • Hsinchu
  • Information Systems Research Center
  • Nano Device Laboratory
  • Hsinchu Science Park
  • Hsinchu Science Park
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Manufacture Co.
  • NARL
  • Taiwan Semiconductor Research Institute
  • National Cheng Kung University

External person

M. A. Khaderbad

  • Taiwan Semiconductor Manufacturing Company

External person

Hai Dang Trinh

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Department of Materials Science and Engineering
  • Department of Physics
  • Hanoi National University of Education
  • Taiwan Semiconductor Manufacturing Company
  • Department of Material Science and Engineering

External person

B. Y. Chen

  • National Nano Device Laboratories Taiwan
  • Hsinchu
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Manufacture Co.
  • National Applied Research Laboratories Taiwan
  • National Yang Ming Chiao Tung University
  • NARL
  • Taiwan Semiconductor Research Institute

External person

M. Feng

  • California Institute of Technology
  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department
  • Univ. Illinois at Urbana-Champaign
  • CCEEL
  • Department of Materials Science and Engineering
  • Dept. of Mat. Sci. and Engineering

External person

Hui Cheng Chang

  • Taiwan Semiconductor Manufacturing Company

External person

J. M. Chabala

  • Department of Materials Science and Engineering
  • Northwestern University
  • The University of Chicago

External person

Jagadeesh Pamulapati

  • Center for High-Frequency Microelectronics
  • University of Michigan, Ann Arbor
  • Electronics and Power Sources Directorate
  • United States Army Research Laboratory
  • Rutgers - The State University of New Jersey, New Brunswick
  • U.S. Army ETDL
  • Rutgers University

External person

H. C.H. Wang

  • Taiwan Semiconductor Manufacturing Company
  • National Taichung University of Science and Technology

External person

Y. Y. Chen

  • Taiwan Semiconductor Manufacturing Company

External person

Shin Yuan Wang

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Department of Electrical Engineering
  • Dept. of Electronics Engineering
  • Department of Electronics Engineering and Institute of Electronics
  • Institute of Electronics
  • Natl Chiao Tung Univ, National Chiao Tung University, Coll Elect & Comp Engn, Inst Electroopt Engn
  • National Applied Research Laboratories Taiwan

External person

Young Kim

  • Department of Metallurgy and Mining Engineering
  • University of Illinois at Urbana-Champaign

External person

Chi Chung Kei

  • National Applied Research Laboratories Taiwan
  • Instrument Technology Research Center
  • Department of Materials Science and Engineering
  • National Tsing Hua University
  • Department of Materials Science and Engineering
  • Precision Instrument Development Center

External person

Hua Lun Ko

  • National Yang Ming Chiao Tung University

External person

J. Li

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign

External person

Chih Yu Teng

  • National Yang Ming Chiao Tung University

External person

Yu Chuan Shih

  • Taiwan Semiconductor Manufacturing Company

External person

S. G. Bishop

  • California Institute of Technology
  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department

External person

Wen Chin Lee

  • University of California at Berkeley
  • IEEE
  • Intel
  • Taiwan Semiconductor Manufacturing Company
  • Department of Electrical Engineering
  • Advanced Micro Devices
  • Strategie Technology Group
  • Department of EECS
  • Hitachi, Ltd.
  • Exploratory Research Division
  • Department of Electrical Engineering and Computer Science
  • Dept. of Elec. Eng./Comp. Sciences
  • Department of Electrical Engineering

External person

Chun Yen Peng

  • Department of Electrical Engineering
  • National Taiwan University
  • Institute of Photonics and Optoelectronics
  • Hon Hai Research Institute
  • Hon Hai Research Institute
  • Hon Hai Precision Industry

External person

R. S. Batzer

  • Semiconduct. Prod. Grp./Qual. R.
  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign
  • Intel

External person

Kuniyuki Kakushima

  • Department of Electronics and Applied Physics
  • Tokyo Institute of Technology
  • Interdisciplinary Graduate School of Sci. and Eng.
  • Interdisciplinary Graduate School of Science and Technology
  • Department of Physical Electronics
  • The University of Tokyo
  • CSIR - Indian Institute of Chemical Technology
  • Frontier Collaborative Research Center
  • Université Grenoble Alpes
  • The Electrochemical Society
  • Kyoto University
  • CSIR - National Physical Laboratory
  • IMEP (UMR CNRS-INPG-UJF) ENSERG

External person

G. Vellianitis

  • TSMC
  • TSMC R and D Europe B.V.

External person

Yu Heng Hong

  • Department of Photonics and Institute of Electro-Optical Engineering
  • National Yang Ming Chiao Tung University
  • Department of Photonics
  • Natl Chiao Tung Univ, National Yang Ming Chiao Tung University, Coll Elect & Comp Engn, Grad Inst Electroopt Engn
  • Hon Hai Research Institute
  • Hon Hai Precision Industry

External person

J. I. Malin

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Dept. of Mat. Sci. and Engineering

External person

Pang Yan Tsai

  • Taiwan Semiconductor Manufacturing Company

External person

C. Boldt

  • Department of Materials Science and Engineering
  • Northwestern University

External person

H. C. Liu

  • California Institute of Technology
  • University of Illinois at Urbana-Champaign
  • Inst. for Microstructural Sciences
  • National Research Council of Canada
  • Inst. of Microstructural Sciences
  • Institute for Microstructural Sciences

External person

Y. S. Chang

  • Taiwan Semiconductor Manufacturing Company

External person

Yuh Jen Cheng

  • Academia Sinica - Research Center for Applied Science
  • Department of Electro-Optical Engineering
  • National Yang Ming Chiao Tung University
  • Department of Photonics
  • Research Center for Applied Sciences
  • Department of Photonic
  • Department of Electrical Engineering
  • Department of Photonics and Institute of Electro-Optical Engineering
  • Department of Photonics
  • Department of Photonics
  • Department of Photonics
  • Research Center for Applied Sciences
  • Department of Photonics
  • Department of Photonics
  • Department of Photonics
  • Department of Photonics
  • Acad Sinica, Academia Sinica - Taiwan, Res Ctr Appl Sci

External person

P. Y. Tsai

  • Taiwan Semiconductor Manufacturing Company

External person

Wei Chou Hsu

  • Institute of Microelectronics
  • National Cheng Kung University
  • Institute of Microelectronics
  • Institute of Microelectronics
  • Advanced Optoelectronic Technology Center
  • Department of Electrical Engineering
  • Institute of Microelectronics
  • Department of Electrical Engineering

External person

W. Fang

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Dept. of Mat. Sci. and Engineering

External person

P. Ramvall

  • Lund University

External person

Fan Ren

  • Department of Chemical Engineering
  • University of Florida
  • Department of Chemical Engineering
  • Lucent
  • Department of Chemical Engineering
  • Multiplex Inc.

External person

D. Ahmari

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign

External person

You Chen Weng

  • National Yang Ming Chiao Tung University
  • Institute of Lighting and Energy Photonics

External person

P. J. Sung

  • Department of Electrophysics
  • National Nano Device Laboratories Taiwan
  • National Yang Ming Chiao Tung University
  • National Applied Research Laboratories Taiwan
  • Hsinchu
  • Scientific
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Manufacture Co.
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • NARL
  • Taiwan Semiconductor Research Institute (TSRI)
  • Taiwan Semiconductor Research Institute

External person

Azrul Azlan Hamzah

  • Universiti Kebangsaan Malaysia
  • Institute of Micronengineering and Nanoelectronics (IMEN)
  • Univ Kebangsaan Malaysia, Universiti Kebangsaan Malaysia, Inst Microengn & Nanoelect

External person

F. Ren

  • Rutgers - The State University of New Jersey, New Brunswick
  • Rutgers University

External person

C. H. Fan

  • Taiwan Semiconductor Manufacturing Company

External person

Chun-Jung Su

  • Taiwan Semiconductor Research Institute

External person

Deepak Anandan

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University

External person

T. U. Norton

  • CCEEL
  • University of Illinois at Urbana-Champaign

External person

Debashis Panda

  • National Yang Ming Chiao Tung University

External person

P. Ahmet

  • Frontier Research Center
  • Tokyo Institute of Technology
  • Department of Electronics and Applied Physics
  • Frontier Collaborative Research Center
  • The Electrochemical Society

External person

H. J. Lin

  • Taiwan Semiconductor Manufacturing Company

External person

M. Passlack

  • TSMC
  • TSMC R and D Europe B.V.

External person

Q. J. Hartmann

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign

External person

Ching Yao Liu

  • National Yang Ming Chiao Tung University

External person

Jui-Sheng Wu

  • National Yang Ming Chiao Tung University

External person

An Chen Liu

  • National Yang Ming Chiao Tung University
  • Natl Chiao Tung Univ, National Yang Ming Chiao Tung University, Coll Elect & Comp Engn, Grad Inst Electroopt Engn

External person

M. H. Tsai

  • Taiwan Semiconductor Manufacturing Company

External person

R. L. Chu

  • Taiwan Semiconductor Manufacturing Company

External person

Shih Hong Chen

  • Taiwan Semiconductor Manufacture Co.
  • National Applied Research Laboratories Taiwan
  • NARL

External person

J. Y. Cheng

  • Rutgers - The State University of New Jersey, New Brunswick
  • Rutgers University

External person

Li Chuan Tang

  • National Yang Ming Chiao Tung University

External person

T. L. Lee

  • Taiwan Semiconductor Manufacturing Company

External person

Yi Miao Hua

  • National Yang Ming Chiao Tung University

External person

Wei Cheng Lin

  • National Yang Ming Chiao Tung University

External person

A. Daga

  • Department of Materials Science and Engineering
  • University of Illinois at Urbana-Champaign
  • Department of Materials Science

External person

Shih Chen Chen

  • Hon Hai Precision Industry

External person

M. Taysing-Lara

  • Electronics and Power Sources Directorate
  • United States Army Research Laboratory
  • Rutgers - The State University of New Jersey, New Brunswick
  • Rutgers University

External person

Jun Da Chen

  • Hon Hai Research Institute

External person

J. Mazumder

  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign
  • Ctr. for Laser-Aided Mat. Processing
  • Center for Laser-Aided Material Processing

External person

R. Plass

  • Department of Materials Science and Engineering
  • Northwestern University

External person

Tsung Te Chou

  • National Applied Research Laboratories Taiwan

External person

C. J. Su

  • National Nano Device Laboratories Taiwan
  • Department of Electrical Engineering
  • National Yang Ming Chiao Tung University
  • Institute of Electronics
  • Department of Electronics Engineering and Institute of Electronics
  • Nano Facility Center
  • Institute of Electronics
  • Hsinchu
  • Department O Electronics Engineering
  • Department of Electrical Engineering
  • IEEE
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • National Applied Research Laboratories Taiwan
  • Taiwan Semicond Res Inst
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Research Institute
  • Taiwan Semiconductor Manufacture Co.
  • Taiwan Semiconductor Research Institute
  • University of Houston
  • Taiwan Semiconductor Research Institute (TSRI)

External person

D. Turnbull

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign

External person

R. Oxland

  • TSMC
  • TSMC R and D Europe B.V.

External person

E. Lind

  • Lund University

External person

Hoang Tan Ngoc Nguyen

  • National Yang Ming Chiao Tung University

External person

H. Hsia

  • Univ. Illinois at Urbana-Champaign
  • University of Illinois at Urbana-Champaign
  • CCEEL
  • Department of Materials Science and Engineering

External person

Y. Oniki

  • Taiwan Semiconductor Manufacturing Company

External person

J. M. Gibson

  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign

External person

W. E. Mayo

  • Dept. of Mechanics and Mat. Science
  • Rutgers - The State University of New Jersey, New Brunswick
  • Lucent
  • Department of Chemical Engineering
  • University of Florida
  • Rutgers University

External person

Venkatesan Nagarajan

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Hexawave, Inc.

External person

Tze Liang Lee

  • Taiwan Semiconductor Manufacturing Company

External person

Tsung Ying Yang

  • National Yang Ming Chiao Tung University

External person

Y. C. Wang

  • Rutgers - The State University of New Jersey, New Brunswick
  • Electrical and Computer Engineering Department
  • Lucent
  • Department of Ceramic and Materials Engineering
  • Rutgers University

External person

Le Trung Hieu

  • National Yang Ming Chiao Tung University

External person

Y. C. Wang

  • Lucent
  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Lucent Technologies

External person

K. C. Hsieh

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • CCEEL
  • Dept. of Mat. Sci. and Engineering
  • Nano Device Laboratory
  • National Yang Ming Chiao Tung University

External person

Tsung Che Chiang

  • National Yang Ming Chiao Tung University

External person

C. L. Yang

  • Taiwan Semiconductor Manufacturing Company

External person

Ping Yu Tsai

  • National Yang Ming Chiao Tung University

External person

I. Adesida

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Dept. of Mat. Sci. and Engineering

External person

C. L. Hung

  • Taiwan Semiconductor Manufacturing Company

External person

Zhen Hao Li

  • National Yang Ming Chiao Tung University

External person

V. P. Dravid

  • Department of Materials Science and Engineering
  • Northwestern University
  • Department of Materials Science and Engineering

External person

D. K. Sengupta

  • California Institute of Technology
  • University of Illinois at Urbana-Champaign
  • Elec. and Comp. Eng. Department
  • Ctr. Space Microlectron. Technol.
  • Jet Propulsion Laboratory, California Institute of Technology
  • Ctr. Space Microelectronics Technol.
  • Dept. of Mat. Sci. and Engineering

External person

Chia Chiung Lo

  • Taiwan Semiconductor Manufacturing Company

External person

M. Wraback

  • Electronics and Power Sources Directorate
  • United States Army Research Laboratory
  • Rutgers - The State University of New Jersey, New Brunswick
  • Rutgers University

External person

J. P. Zhang

  • Department of Materials Science and Engineering
  • Northwestern University

External person

L. E. Wernersson

  • Lund University

External person

Ting Wei Chuang

  • Institute of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Department of Materials Science and Engineering

External person

D. Scott

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Univ. Illinois at Urbana-Champaign

External person

F. Ren

  • Rutgers - The State University of New Jersey, New Brunswick
  • Rutgers University

External person

Young Kai Chen

  • Communication Science Research Department
  • Lucent
  • Communication Science Research Department at Bell Laboratories
  • Nokia
  • Defense Advanced Research Projects Agency
  • Communication Science Research Department
  • Communication Science Research Department at Bell Laboratories
  • Department of Chemical Engineering
  • University of Florida

External person

A. Sodonis

  • The University of Chicago

External person

Z. Tang

  • CCEEL
  • University of Illinois at Urbana-Champaign
  • Department of Materials Science and Engineering

External person

C. H. Hsieh

  • Taiwan Semiconductor Manufacturing Company

External person

Y. K. Leung

  • Taiwan Semiconductor Manufacturing Company

External person

Sang Woo Lee

  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign
  • Dept. Mat. Sci. Eng. Frederick S.
  • Department of Materials Science and Engineering
  • Department of Materials Science

External person

Jui Sheng Wu

  • National Yang Ming Chiao Tung University

External person

Jing-Wei Lin

  • National Yang Ming Chiao Tung University

External person

T. C. Huang

  • Taiwan Semiconductor Manufacturing Company

External person

Ying Hao Chu

  • National Yang Ming Chiao Tung University
  • National Tsing Hua University

External person

X. Lu

  • Dept. of Mat. Sci. and Engineering
  • University of Illinois at Urbana-Champaign

External person

Min Lu Kao

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University

External person

C. H. Chen

  • Taiwan Semiconductor Manufacturing Company
  • Research and Development
  • Institute of Microelectronics
  • National Cheng Kung University
  • Logic Technology Division

External person

Yuan Lin

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University

External person

Chen Yu Chen

  • Institute of Materials Science and Engineering
  • National Yang Ming Chiao Tung University

External person

C. H. Wang

  • TSMC
  • National Cheng Kung University
  • Department of Electrical Engineering

External person

Yu Sheng Chiu

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Compound Semiconductor Device Laboratory

External person

Joseph S. Weiner

  • Department of Chemical Engineering
  • Multiplex Inc.
  • University of Florida
  • Lucent

External person

N. Holonyak

  • University of Illinois at Urbana-Champaign

External person

D. A. Kellogg

  • University of Illinois at Urbana-Champaign

External person

Ping Yu Tsai

  • National Yang Ming Chiao Tung University

External person

G. Doornbos

  • TSMC
  • TSMC R and D Europe B.V.

External person

R. Droopad

  • Ingram School of Engineering
  • Texas State University

External person

Yung Yu Lai

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Academia Sinica - Research Center for Applied Science

External person

Hong Quan Nguyen

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University
  • Department of Materials Science and Engineering
  • Department of Electrical Engineering

External person

S. L. Chuang

  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Dept. of Mat. Sci. and Engineering

External person

H. C. Chen

  • Taiwan Semiconductor Manufacturing Company

External person

Le Trung Hieu

  • National Yang Ming Chiao Tung University

External person

Wei Li Li

  • National Yang Ming Chiao Tung University

External person

Xia Xi Zheng

  • Department of Materials Science and Engineering
  • National Yang Ming Chiao Tung University

External person

James R. Lothian

  • Department of Ceramic and Materials Engineering
  • Lucent
  • Rutgers - The State University of New Jersey, New Brunswick
  • Elec. and Comp. Eng. Department
  • University of Illinois at Urbana-Champaign
  • Filtronic Solid State
  • Rutgers University

External person

Yong Jyun Wang

  • National Tsing Hua University

External person

W. C. Lee

  • Department of Electrophysics
  • National Yang Ming Chiao Tung University
  • Industrial Technology Research Institute Hsinchu

External person