Material Science
Silicon
100%
Nanowire
97%
Film
94%
Lithography
81%
Surface (Surface Science)
81%
Gold Nanoparticles
69%
Sol-Gel
63%
Density
49%
Nanoparticle
48%
Thin-Film Transistor
47%
Dielectric Material
42%
Field Effect Transistor
40%
Capacitor
35%
Thin Films
33%
Monolayers
31%
Spin Coating
29%
Annealing
28%
Hafnium
25%
Polyimide
24%
Zirconia
24%
Oxide Compound
23%
Silicate
23%
Copolymer
22%
Wet Etching
20%
Self Assembly
19%
Zirconium
18%
Silicon Dioxide
18%
Electrical Property
17%
Nanostructure
17%
Polystyrene
15%
Silicide
14%
Silsesquioxane
14%
Ultrathin Film
14%
Gold Nanoparticle
13%
Charge Trapping
12%
Semiconductor Device
12%
Titanium Dioxide
12%
Nanodots
12%
Hydrogen Bonding
12%
Nitride Compound
12%
Thermal Stability
12%
X-Ray Photoelectron Spectroscopy
12%
Atomic Force Microscopy
11%
Platinum
10%
Silver Nanoparticle
10%
Transistor
9%
Tantalum Oxides
9%
Quantum Dot
9%
Fullerene
9%
Electroless Deposition
9%
Composite Material
9%
Phase Composition
9%
Capacitance
9%
Aluminum Oxide
9%
Transmission Electron Microscopy
8%
DNA
8%
Analytical Method
8%
Nanorod
7%
Polyhedral Oligomeric Silsesquioxane
7%
Poly Methyl Methacrylate
7%
Catalyst Activity
7%
Oxide Surface
7%
Heterojunction
7%
Surface Morphology
6%
Oxide Film
6%
Desorption
6%
Linewidth
6%
Surface Tension
6%
Scanning Electron Microscopy
6%
Light-Emitting Diode
6%
Dielectric Films
6%
Silicon Wafer
6%
Optical Property
6%
Titanium Oxide
6%
Contact Angle
5%
Silicon Nitride
5%
Sensitive Detection
5%
Oxidation Reaction
5%
Permittivity
5%
Keyphrases
Gold Nanoparticles
56%
Sol-gel
47%
Silicon Nanowires (SiNWs)
37%
Thin-film Transistors
34%
Nanowires
33%
Scanning Probe Lithography
32%
Sol-gel Spin Coating
29%
Metal-insulator-metal Capacitor
29%
Polysilicon
27%
Au Nanoparticles (AuNPs)
27%
Electrical Properties
25%
Nanocrystal Memory
24%
Silicon Nanowire Field-effect Transistor (SNWFET)
24%
Gate-all-around
24%
Hafnium Silicate
22%
Silica
22%
Nanoparticles
20%
Gate Dielectric
20%
Wet Etching
20%
Nanostructures
19%
Annealing
19%
Poly-Si
19%
Nanogap Electrodes
19%
NWFET
19%
Rapid Thermal Annealing
18%
Electrical Characteristics
17%
Memory Device
17%
Flash Memory
17%
Field-effect Transistors
16%
Electrical Performance
16%
Nanocrystals
15%
SiO2 Surface
15%
Self-aligned
15%
Selective Deposition
15%
Low Leakage Current
15%
Zirconium Silicate
15%
Leakage Current Density
15%
Optical Lithography
15%
Plasma Treatment
15%
Charge Retention
14%
Microwave Heating
14%
Nanogap
14%
Self-assembled Monolayer
14%
Organic Thin-film Transistors
14%
Poly(3-hexylthiophene) (P3HT)
14%
Silicon Oxide
14%
Electron Beam Lithography
13%
Ultrathin Films
13%
Wafer
13%
Poly(4-vinylpyridine)
13%
High Performance
13%
Atomic Force Microscopy
13%
Polysilicon Nanowires
12%
Electron Beam
12%
Conductance
12%
N-(2-aminoethyl)-3-aminopropyltrimethoxysilane
12%
Local Joule Heating
12%
Polyimide Substrate
12%
Flexible Polyimide Substrates
11%
Nanofabrication Techniques
11%
Charge Trapping Layer
11%
Label-free Detection
11%
X-ray Photoelectron Spectroscopy
11%
Ultrasensitive
11%
Nanodot Array
11%
Target DNA
11%
Silicon-oxide-nitride-oxide-silicon (SONOS)
10%
Lithography
10%
Silicon Dioxide
10%
O2 Plasma
10%
P123
10%
Memory Window
10%
Oxide Surfaces
10%
Deoxyribonucleic Acid
10%
Fabrication Methods
10%
Core-shell
9%
Nanoparticle Synthesis
9%
Yb2O3
9%
Tantalum Oxide
9%
Multi-channel
9%
Nitrided Oxide
9%
Selective Growth
9%
Functionalized Gold Nanoparticles
9%
Label-free Biosensor
9%
Silsesquioxane
9%
Gene mutation
9%
Polyhedral Oligomeric Silsesquioxane
9%
Electroless Deposition
9%
Gray Level
9%
Resistive Switching
9%
Composite Materials
9%
Low Temperature
9%
Oxide Nitride
9%
Multi-walled Carbon Nanotubes (MWCNTs)
9%
Impedance Biosensor
9%
Prostate-specific Antigen
9%
Ultra-thin Body
9%
Surface Cleaning
9%
Dip-pen Nanolithography
9%
Increased Reliability
9%